Abstract
NbN and Nb-Si-N films were deposited by magnetron sputtering the Nb and Si targets on silicon wafers at various bias voltages, Us. The deposited films were annealed to establish their thermal stability. The films were investigated by atomic force microscope, X-ray diffraction, X-ray photoelectron spectroscopy and nanoindentation. The NbN films were nanostructured, and the Nb-Si-N films had a nanocomposite structure, and represented an aggregation of -NbNx nanocrystallites embedded into the amorphous Si3N4 tissue (nc-NbNx/a-Si3N4).
Cite
CITATION STYLE
Ivashchenko, V. I., Scrynskyy, P. L., Lytvyn, O. S., Rogoz, V. M., Sobol, O. V., Kuzmenko, A. P., … Karvat, C. (2015). Investigation of NbN and Nb-Si-N coatings deposited by magnetron sputtering. In Acta Physica Polonica A (Vol. 128, pp. 949–952). Polish Academy of Sciences. https://doi.org/10.12693/APhysPolA.128.949
Register to see more suggestions
Mendeley helps you to discover research relevant for your work.
