Abstract
The resistivities of epitaxially grown silver films have been measured as a function of temperature from 4.2 to 295°K. Both the temperature-independent residual resistivity and the temperature-dependent resistivity were found to increase with a decrease in the specimen thickness. The increase in the temperature-dependent part of the resistivity occurs in the temperature interval of 10 to 40°K. It may be interpreted as being due to low-angle electron-phonon scattering, which causes a greater increment of resistivity in a film than in a bulk specimen. © 1968 The American Physical Society.
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CITATION STYLE
Tanner, D. B., & Larson, D. C. (1968). Electrical resistivity of silver films. Physical Review, 166(3), 652–655. https://doi.org/10.1103/PhysRev.166.652
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