Residual stress and interface effect on dielectric mechanisms in poled ultrathin relaxor ferroelectric single crystals

5Citations
Citations of this article
5Readers
Mendeley users who have this article in their library.
Get full text

Abstract

We have investigated the dielectric performances and mechanism of super-thin Mn-doped Pb(Mg1/3Nb2/3)O3-PbTiO 3 crystals, exhibiting significantly different dielectric behaviors compared with thick wafer. Dramatic decrease by 5 times and large frequency dispersion of permittivity, changed diffuse degree of phase transition, dielectric loss anomaly with frequency and dielectric performances with direct-current electric field for thin wafers are observed, proving the existence of large surface residual stress and interface effects. Additionally, a theoretical model of low-permittivity and low-ferroelectric surface damage layers is concurrently proposed. These observations have important implications for actual performances of thin wafers applied in practical devices. © 2014 AIP Publishing LLC.

Cite

CITATION STYLE

APA

Li, L., Zhao, X., Li, X., Xu, Q., Yang, L., Wang, S., & Luo, H. (2014). Residual stress and interface effect on dielectric mechanisms in poled ultrathin relaxor ferroelectric single crystals. Journal of Applied Physics, 115(20). https://doi.org/10.1063/1.4879250

Register to see more suggestions

Mendeley helps you to discover research relevant for your work.

Already have an account?

Save time finding and organizing research with Mendeley

Sign up for free