Abstract
This book is aimed at new and experienced engineers, technology managers, and senior technicians who want to enrich their understanding of the image formation physics of a lithographic system. Readers will gain knowledge of the basic equations and constants that drive optical lithography, learn the basics of exposure systems and image formation, and come away with a full understanding of system components, processing, and optimization. Readers will also get a primer on the outlook of optical lithography and the many next-generation technologies that may greatly enhance semiconductor manufacturing in the near future.
Cite
CITATION STYLE
Lin, B. J. (2010). Optical lithography: Here is why. Optical Lithography: Here is Why (pp. 1–478). SPIE. https://doi.org/10.1117/3.821000
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