Self-Attention-Augmented Generative Adversarial Networks for Data-Driven Modeling of Nanoscale Coating Manufacturing

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Abstract

Nanoscale coating manufacturing (NCM) process modeling is an important way to monitor and modulate coating quality. The multivariable prediction of coated film and the data augmentation of the NCM process are two common issues in smart factories. However, there has not been an artificial intelligence model to solve these two problems simultaneously. Focusing on the two problems, a novel auxiliary regression using a self-attention-augmented generative adversarial network (AR-SAGAN) is proposed in this paper. This model deals with the problem of NCM process modeling with three steps. First, the AR-SAGAN structure was established and composed of a generator, feature extractor, discriminator, and regressor. Second, the nanoscale coating quality was estimated by putting online control parameters into the feature extractor and regressor. Third, the control parameters in the recipes were generated using preset parameters and target quality. Finally, the proposed method was verified by the experiments of a solar cell antireflection coating dataset, the results of which showed that our method performs excellently for both multivariable quality prediction and data augmentation. The mean squared error of the predicted thickness was about 1.6~2.1 nm, which is lower than other traditional methods.

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APA

Ji, S., Zhu, J., Yang, Y., Zhang, H., Zhang, Z., Xia, Z., & Zhang, Z. (2022). Self-Attention-Augmented Generative Adversarial Networks for Data-Driven Modeling of Nanoscale Coating Manufacturing. Micromachines, 13(6). https://doi.org/10.3390/mi13060847

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