Grain size and phase transformation behavior of TiNi shape-memory-alloy thin film under different deposition conditions

Abstract

TiNi shape-memory-alloy thin films can be used as small high-speed actuators or sensors because they exhibit a rapid response rate. In recent years, the transformation temperature of these films, manufactured via a magnetron sputtering method, was found to be lower than that of the bulk alloys owing to the small size of the grain. In this study, deposition conditions (growth rate, film thickness, and substrate temperature) affecting the grain size of thin films were investigated. The grain size of the thin film alloys was found to be most responsive to the substrate temperature.