Schottky contacts to In2O3

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Abstract

n-type binary compound semiconductors such as InN, InAs, or In 2O3 are especial because the branch-point energy or charge neutrality level lies within the conduction band. Their tendency to form a surface electron accumulation layer prevents the formation of rectifying Schottky contacts. Utilizing a reactive sputtering process in an oxygen-containing atmosphere, we demonstrate Schottky barrier diodes on indium oxide thin films with rectifying properties being sufficient for space charge layer spectroscopy. Conventional non-reactive sputtering resulted in ohmic contacts. We compare the rectification of Pt, Pd, and Au Schottky contacts on In2O3 and discuss temperature-dependent current-voltage characteristics of Pt/In2O3 in detail. The results substantiate the picture of oxygen vacancies being the source of electrons accumulating at the surface, however, the position of the charge neutrality level and/or the prediction of Schottky barrier heights from it are questioned. © 2014 Author(s).

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Von Wenckstern, H., Splith, D., Schmidt, F., Grundmann, M., Bierwagen, O., & Speck, J. S. (2014). Schottky contacts to In2O3. APL Materials, 2(4). https://doi.org/10.1063/1.4870536

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