Fabry-Ṕrot interferometry for microplasma diagnostics

Abstract

A new method for determining the electron density of a thin plasma by means of Fabry-Ṕrot interferometry is proposed. The interferometer consists of two plasma layers and dielectric material surrounded by two plasma layers. The transmittance of electromagnetic waves across the interferometer is calculated, and Fabry-Ṕrot resonances are demonstrated. It is shown that the electron density can be determined from the measurement of the Fabry-Ṕrot resonance frequencies. This method can also be applied to the measurement of conduction electron density in semiconductor films. © 2006 American Institute of Physics.