Band alignments of coherently strained GexSi1-x/Si heterostructures on 〈001〉 GeySi1-y substrates

292Citations
Citations of this article
24Readers
Mendeley users who have this article in their library.
Get full text

Abstract

The self-consistent ab initio pseudopotential results of C. G. Van de Walle and R. M. Martin [J. Vac. Sci. Technol. B 3, 1256 (1985)] have been combined with a phenomenological deformation potential theory to estimate the band gap and band offsets for coherently strained multilayers of GexSi 1-x/Si for growth on 〈001〉 GeySi1-y substrates. It is found that ΔEc is negligible and the narrower GexSi1-x gap falls within the wider Si gap (type I band alignment) if the Si in the multilayers is cubic, whereas ΔEc can be appreciable and the GexSi1-x conduction-band edge tends to be higher in energy than the Si conduction-band edge(type II band alignment) if both the Si and the GexSi1-x are strained. In particular, the present results resolve the seeming paradox which arose from interpretations of modulation doping experiments using heterojunctions grown either on Si〈001〉 substrates or on an unstrained alloy buffer layer.

Cite

CITATION STYLE

APA

People, R., & Bean, J. C. (1986). Band alignments of coherently strained GexSi1-x/Si heterostructures on 〈001〉 GeySi1-y substrates. Applied Physics Letters, 48(8), 538–540. https://doi.org/10.1063/1.96499

Register to see more suggestions

Mendeley helps you to discover research relevant for your work.

Already have an account?

Save time finding and organizing research with Mendeley

Sign up for free