Abstract
Structural transformations in Ni/Si-based contacts to GaN occurring under heat treatment have been studied using transmission electron microscopy and secondary ion mass spectrometry. Transition from non-ohmic to ohmic behavior correlates with reaction between Ni and Si, and decomposition of the initially formed interfacial Ni:Ga:N layer. Transport of dopant atoms from metallization into GaN testifies in favour of the SPR process of ohmic contact formation.
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CITATION STYLE
Kaminska, E., Piotrowska, A., Jasinski, J., Kozubowski, J., Barcz, A., Golaszewska, K., … Bremser, M. D. (1999). Ni/Si-based contacts to GaN: Thermally activated structural transformations leading to ohmic behavior. In MRS Internet Journal of Nitride Semiconductor Research (Vol. 4). Materials Research Society. https://doi.org/10.1557/s1092578300003549
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