Kinetics of Evaporation of Alloying Elements under Vacuum: Application to Ti alloys in Electron Beam Melting

Abstract

Vacuum metallurgical processes such as the electron beam melting are highly conducive to volatilization. In titanium processing, it concerns the alloying elements which show a high vapor pressure with respect to titanium matrix, such as Al. Two different experimental approaches using a laboratory electron beam furnace have been developed for the estimation of volatilization rate and activity coefficient of Al in Ti64. The first innovative method is based on the deposition rate of Al on Si wafers located at different angles θ above the liquid bath. We found that a deposition according to a cos2(π/2-θ) law describes well the experimental distribution of the weight of the deposition layer. The second approach relies on the depletion of aluminum in the liquid pool at two separate times of the volatilization process. Both approaches provide values of the Al activity coefficient at T=1, 860 °C in a fairly narrow range [0.044-0.0495], in good agreement with the range reported in the literature. Furthermore numerical simulation of the Al behavior in the liquid pool reveals (in the specific case of electron beam button melting) a weak transport resistance in the surface boundary layer.