Abstract
A Mueller matrix spectroscopic ellipsometry approach was used to investigate the anisotropic dielectric constants of corundum α-(AlxGa1−x)2O3 thin films in their below bandgap spectral regions. The sample set was epitaxially grown using plasma-assisted molecular beam epitaxy on m-plane sapphire. The spectroscopic ellipsometry measurements were performed at multiple azimuthal angles to resolve the uniaxial dielectric properties. A Cauchy dispersion model was applied, and high-frequency dielectric constants are determined for polarization perpendicular and parallel ∞ to the thin film c-axis. The optical birefringence is negative throughout the composition range, and the overall index of refraction substantially decreases upon incorporation of Al. We find small bowing parameters of the high-frequency dielectric constants with ⊥and 0.307.
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CITATION STYLE
Hilfiker, M., Kilic, U., Stokey, M., Jinno, R., Cho, Y., Xing, H. G., … Schubert, M. (2021). High-frequency and below bandgap anisotropic dielectric constants in α-(AlxGa1-x)2O3 (0 ≤ x ≤ 1). Applied Physics Letters, 119(9), 1ENG. https://doi.org/10.1063/5.0064528
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