Formation of PZT crack-free thick films by electrohydrodynamic atomization deposition

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Abstract

In this work, electrohydrodynamic atomization was used to spray deposit lead zirconate titanate (PZT) thick films using a PZT composite sol-gel slurry. During atomization splats and clusters were generated from jet break-up. The influence of atomization-substrate distance on the characteristics of splats and clusters was analysed. At a greater distance dried clusters were predominant, which led to the formation of porous films; conversely, at a smaller distance wet splats dominated, which generated dense films. A distance of 10 mm was found to be the optimum deposition distance for this slurry to produce dense films. 28 μm thick PZT crack-free films were produced by depositing 60 layers of slurry using this technique. The resulting films had a homogenous microstructure and exhibited a relative permittivity of ∼ 220 and d33, f of ∼71 pC N-1. © 2008 Elsevier Ltd. All rights reserved.

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Wang, D., Edirisinghe, M. J., & Dorey, R. A. (2008). Formation of PZT crack-free thick films by electrohydrodynamic atomization deposition. Journal of the European Ceramic Society, 28(14), 2739–2745. https://doi.org/10.1016/j.jeurceramsoc.2008.04.013

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