Redox Deposition of Silica Thin Films: Effect of Hydrogen Peroxide and Poly(vinylpyrrolidone) on Film Growth

Abstract

Effects of H2 O2 and poly(N -vinylpyrrolidone) (PVP) additives on silica thin-film deposition by the redox reaction of an aqueous ammonium hexafluorosilicate (AFS) solution with reducing agent dimethylamine borane onto poly(ethylene terephthalate) (PET) and Si substrates were investigated. The trivial addition of H2 O2 (a few percent) and PVP (1 ppm) greatly improved the rate of film growth and the stability of reaction solution. X-ray photoelectron spectroscopic and infrared spectroscopic analyses as well as surface (scanning electron microscopy) and inner phase (transmission electron microscopy) morphological characterization of the silica films were performed using varying concentrations of PVP. A model for the manner of the silica-film deposition based on the attractive or repulsive interaction among silica spherical granular, PVP, and PET substrate was proposed. © 2008 The Electrochemical Society.