Unravelling the doping mechanism and origin of carrier limitation in Ti-doped In2O3 films

Abstract

Ti-doped In 2 O 3 thin films with varying Ti contents are prepared by partial reactive co-sputtering using ceramic In 2 O 3 and metallic Ti targets and characterized by in situ x-ray photoelectron spectroscopy, electrical conductivity, and Hall-effect measurements. For a substrate temperature of 400 ° C , the carrier concentration increases faster than the Ti content and saturates at ≈ 7.4 × 10 20 c m − 3 . Based on these results, it is suggested that Ti does not directly act as donor in In 2 O 3 but is rather forming TiO 2 precipitates and that the related scavenging of oxygen generates oxygen vacancies in In 2 O 3 as origin of doping. Neutralization of oxygen vacancies is, therefore, suggested to be origin of the limitation of the carrier concentration in Ti-doped In 2 O 3 films.