Chemical Vapor Deposition of Tungsten Oxide

Abstract

Crystalline and amorphous thin films of tungsten(VI) oxide can be prepared by chemical vapor deposition using a variety of volatile precursors below 500°C. Deposition parameters for preparation of WO3 films from tungsten hexacarbonyl [W(CO)6], tungsten hexafluoride (WF6), tungsten ethoxides [W(OEt)x, x = 5, 6] and tetra(allyl)tungsten [W(η3-C3H5)4] are summarized. The electrochromic behavior of these films is comparable with that observed for WO3 films prepared by evaporation, sputtering and electrodeposition. © 1998 John Wiley & Sons, Ltd.