Roll-type photolithography for continuous fabrication of narrow bus wires

Abstract

This paper presents a continuous patterning method to enhance the productivity of metallic microstructure fabrication. The minimum exposure time and the optimum ultraviolet (UV) intensity were determined for the photoresist (PR) to develop micro PR patterns in continuous roll-type photolithography. To confirm the efficiency of continuous roll-type photolithography, wet etching was performed instead of dry etching as a post-lithography process. Parametric study results showed that the minimum exposure time required for sufficient PR reaction during continuous roll-type photolithography was 0.2 s under 1000 mW cm-2 of UV intensity. This study demonstrated roll-type photolithography and determined the highest production speed for continuous roll-type photolithography to be 24 mm s-1. Continuous photolithography and wet etching were employed to produce narrow copper bus wires for a bezel-less display panel, indicating the practical applications of continuous roll-type photolithography.