A reliable way of mechanical exfoliation of large scale two dimensional materials with high quality

Abstract

In this work, we have developed a modified way of mechanical exfoliation for making two-dimensional materials by introducing a home-designed exfoliation machine. Optical microscopy was employed to identify the thin-layer (mono- and few-layer) flakes primarily. To testify the high efficiency of our modified exfoliation method, we did a simple statistical work on the exfoliation of graphene and WSe2. Further, we used the Raman spectroscopy and the Atomic Force Microscopy (AFM) to characterize the samples. The results indicated the high quality of the as-fabricated samples. Finally, we developed an exfoliation technique for working with easily oxidizing samples. Our modified exfoliation method would be intriguing and innovative for fabricating two dimensional materials, providing a facile way for making electronic and optoelectronic devices.