Synthesis of Magnetron-Sputtered TiN Thin-Films on Fiber Structures for Pulsed-Laser Emission and Refractive-Index Sensing Applications at 1550 nm

Abstract

In this work, a set of titanium nitrides thin-films was synthesized with the technique of reactive RF and DC magnetron-sputtering. To demonstrate the versatility and effectiveness of the deposition technique, thin films were deposited onto different fiber structures varying the deposition parameters for optical applications as saturable absorbers in passively q-switched fiber lasers and as lossy mode resonance fiber refractometers. After deposition, optical and electronical properties of samples were characterized by UV–Vis and XPS spectroscopies, respectively. Samples presented coexisting phases of Ti nitride and oxide, where the nitride phase was non-stoichiometric metallic-rich, with a band gap in the range of Eg = 3.4–3.7 eV. For all samples, glass substrates were used as templates, and on top of them, optical fibers were mounted to be covered with their respective titanium compounds.