Photostabilizing efficiency of PVC in the presence of Schiff bases as photostabilizers

Abstract

The photostabilization of polyvinyl chloride (PVC) films by Schiff bases was investigated. Polyvinyl chloride films containing 0.5 wt % Schiff bases were produced using the same casting method as that used for additive-free PVC films from tetrahydrofuran (THF) solvent. The photostabilization activities of these compounds were determined by monitoring the carbonyl, polyene and hydroxyl indices with irradiation time. The changes in viscosity average molecular weight of PVC with irradiation time were also monitored using THF as a solvent. The quantum yield of chain scission (Φcs) for the studied complexes in PVC was estimated to range between 4.72 and 8.99 × 10-8. According to the experimental results, several mechanisms were suggested, depending on the structure of the additive. Ultra violet (UV) absorption, peroxide decomposition and radical scavenging were suggested as the photostabilizing mechanisms.