Ultrahigh emissivity of grating-patterned PDMS film from 8 to 13 μ m wavelength regime

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Abstract

Polydimethylsiloxane (PDMS) is a prominent material for radiative cooling due to its promising optical properties in the mid-infrared spectral region as well as its fabrication easiness. Even though several works have reported that the mid-infrared emissivity of a PDMS film can be increased by surface modification, there is still room for further enhancement through global optimization. Here, we designed and fabricated the thin PDMS film patterned with two-dimensional gratings to obtain the highest emissivity in the wavelength range from 8 to 13 μm. A surrogate-model-based optimization was performed, and the optimum structure exhibited the averaged emissivity value of 0.99 in the wavelength of 8-13 μm, which is the highest value reported to date among polymer-based radiative coolers. For real-world applications, we also developed the fabrication method that is repeatable and applicable for various surfaces using a flexible master mold.

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Song, J., Seo, J., Han, J., Lee, J., & Lee, B. J. (2020). Ultrahigh emissivity of grating-patterned PDMS film from 8 to 13 μ m wavelength regime. Applied Physics Letters, 117(9). https://doi.org/10.1063/5.0017838

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