Self-organized near-field etching of the sidewalls of glass corrugations

Abstract

Using soda-lime glass with a nano-stripe pattern as a test specimen, we demonstrated self-organized near-field etching with a continuum-wave laser (λ=532 nm) light source. Atomic force microscopy confirmed that near-field etching decreases the flank roughness of the corrugations as well as the roughness of the flat surface. © 2011 The Author(s).