Formation and Physical Properties of h-BN Atomic Layers: A First-Principles Density-Functional Study

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Abstract

Hexagonal boron nitride (h-BN) atomic layers have attracted much attention as a potential device material for future nanoelectronics, optoelectronics, and spintronics applications. This review aims to describe the recent works of the first-principles density-functional study on h-BN layers. We show physical properties induced by introduction of various kinds of defects in h-BN layers. We further discuss the relationship among the defect size, the strain, and the magnetic as well as the electronic properties.

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Fujimoto, Y. (2017). Formation and Physical Properties of h-BN Atomic Layers: A First-Principles Density-Functional Study. Advances in Materials Science and Engineering. Hindawi Limited. https://doi.org/10.1155/2017/2676432

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