E-beam lithography for micro-/nanofabrication

Abstract

Electron beam lithography (EBL) is one of the tools of choice for writing micro- and nanostructures on a wide variety of materials. This is largely due to the fact that modern EBL machines are capable of writing nanometer-sized structures on areas up to mm2. The aim of this contribution is to give technical and practical backgrounds in this extremely flexible nanofabrication technique. © 2010 American Institute of Physics.