Temporal saturation effects of nanoscale contact holes fabricated by chemical shrink techniques

Abstract

The temporal saturation effects of the critical dimensions of nanoscale contact holes are investigated by a two-dimensional reaction-diffusion simulator for the chemical shrink techniques of nanolithography. Models included with the simulator are the crosslinking reaction of water-soluble polymers and crosslinkers, the diffusion of photoacids, and the inactivation of photoacids. Within the the statistical errors of the experimental data, the simulation critical dimensions agree with the experiment for baking temperatures over 105°C and for all baking times. It is found that the temporal saturation of the contact holes' critical dimensions can be explained by the photoacid inactivating reaction included in the simulator. © 2005 The Japan Society of Applied Physics.