Leaf expansion of soybean subjected to high and low atmospheric vapour pressure deficits

Abstract

Vapour pressure deficit (VPD) is considered an important environmental factor that might affect leaf expansion and transpiration rate (TR) in plants. Two slow-wilting soybean (Glycine max (L.) Merr.) genotypes PI 416937 and PI 471938 along with commercial cultivar Hutcheson were subjected to low (1.2-1.6 kPa) and high VPD (2.8-3 kPa) environments to study their leaf expansion and TR over five days. Among the three genotypes, PI 416937 had the lowest increase in its TR (34%) at high VPD compared with low VPD and the greatest decrease in leaf area (31%). In contrast, Hutcheson had the highest increase in TR (87%) under high VPD and the lowest decrease in leaf expansion rate (18%). Expansin and extensin genes were isolated in PI 416937 to determine if changes in leaf expansion were associated with changes at the molecular level. The four studied genes were all suppressed after five days in the high VPD environment.