Impact of the meso-PSi substrate on ZnO thin films deposited by spray pyrolysis technique for UV photodetectors

8Citations
Citations of this article
6Readers
Mendeley users who have this article in their library.
Get full text

Abstract

ZnO thin films were successfully deposited via spray pyrolysis technique over various substrates, including glass, silicon, and mesoporous silicon (PSi). The effect of substrate type on the surface morphological, structural, and electrical properties of ZnO thin film was investigated. Scanning Electron Microscopy confirms the morphology of the meso-PSi substrate and displays the morphologies of the deposited ZnO. The (ZnO/PSi) heterojunction shows a porous ZnO layer with a large surface area by comparison to other structures. The patterns of X-ray Diffraction exposed that the deposited ZnO films have a hexagonal wurtzite polycrystalline structure. Ultraviolet (UV) metal-semiconductor-metal photodetectors have been investigated. The fabricated (ZnO/PSi) UV photodetector showed much higher photocurrent than other structures.

Cite

CITATION STYLE

APA

Rahmani, A., Remache, L., Guendouz, M., Aida, M. s., & Hebboul, Z. (2021). Impact of the meso-PSi substrate on ZnO thin films deposited by spray pyrolysis technique for UV photodetectors. Applied Physics A: Materials Science and Processing, 127(5). https://doi.org/10.1007/s00339-021-04548-z

Register to see more suggestions

Mendeley helps you to discover research relevant for your work.

Already have an account?

Save time finding and organizing research with Mendeley

Sign up for free