Abstract
NiO-based resistive-switching memory (RRAM) is a promising new technology for high-density nonvolatile storage. The main obstacles to practical application are the large and hardly scalable reset (programming) current and the reliability at high temperature. This letter studies temperature-accelerated data retention in RRAM cells from both experimental and theoretical standpoints, addressing the size/nature of the conductive filament and clarifying the tradeoff between data retention and reset current. © 2010 IEEE.
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Ielmini, D., Nardi, F., Cagli, C., & Lacaita, A. L. (2010). Size-dependent retention time in NiO-based resistive-switching memories. IEEE Electron Device Letters, 31(4), 353–355. https://doi.org/10.1109/LED.2010.2040799
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