PRAP-CVD: A Novel Technique to Deposit Intrinsically Conductive Polymers

Abstract

Polymers provide extraordinary opportunities for functionalizing surfaces integrated into flexible devices contributing to a significant advancement in thin-film technologies. Both the advantageous characteristics of conventional polymers (e.g. low weight, flexibility) and the functional physical properties of conventional semiconductors (e.g. absorption and emission of light and a tuneable conductivity) can be found in polymers providing innovative materials. Among polymers with heterocyclic structures, called conjugated polymers, polythiophene remains one of the most intensely researched materials in the field of so called organic electronics owing to the relatively facile and well-established synthetic modifications of the corresponding monomers and its derivatives. In particular, poly(3,4-ethylenedioxythiophene) (PEDOT) is one of the most promising owing to its exceptional stability, transparency, and electrical conductivity. Nevertheless it is difficult to process PEDOT into thin-films by traditional solution-based methods. Plasma Radicals Assisted Polymerisation via Chemical Vapour Deposition (PRAP-CVD) is a novel technique able to overcome the challenges caused by the conventional techniques.