Design and performance analysis of 6T SRAM cell on different CMOS technologies with stability characterization

Abstract

With the advent of portable devices, the demand for static random-access memory (SRAM) is increasing with large use of SRAM in System on Chip and high-performance VLSI circuits. SRAM optimization has become a focal point for research work, as 60% to 70% area of the chip is consumed by the memories. The performance parameters optimization can lead to the overall optimization of the performance of the chip. In this paper design and analysis of the 6T SRAM cell at different technologies using PTM (Predictive Technology Model) model has done with the aim of reducing power dissipation while maintaining stability. Then the performance of SRAM cell is compared on the basis of power dissipation i.e. dynamic power dissipation and static power dissipation, delay, Power Delay Product (PDP) and Static Noise Margin (SNM).SRAM cell read stability and write-stability are major concerns in nanometer CMOS technologies, due to the progressive increase in intra-die variability and Vdd scaling. Cell stability is also examined by the calculation of SNM with the help of the butterfly curve method at different CMOS technologies. Effect of variation of channel length on static power consumption, dynamic power consumption, delay, PDP and SNM is also measured. SNM variation is also observed with the variation of the supply voltage.