Nano-imprint - Molding resists for lithography

Abstract

Patterning resists by molding with a stamp opens ways for the mass-fabrication of nanostructures. The versatility of nano-imprint lithography can be greatly enhanced when copies of valuable stamp originals can be made. For the stamp copying itself we are using nano-imprint, making it possible to generate structures with inverse profiles and different depths. By considering the nanorheological behavior we were able to successfully fabricate various stamp copies for different designs.