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Inductively coupled plasma sources and applications

Physics Research International (2010)
DOI: 10.1155/2010/164249
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Abstract

The principle of inductively coupled plasma (ICP) and perspective of ICP development are reviewed. Multispiral coil ICP (MSC-ICP), which has the advantages of low inductance, high efficiency, and excellent uniformity, is discussed in detail. Applications to thin film processing technologies and the future prospects of ICP are also described. Copyright © 2010 Tomohiro Okumura.

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APA

Okumura, T. (2010). Inductively coupled plasma sources and applications. Physics Research International. https://doi.org/10.1155/2010/164249

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