Self-assembly patterning of nano/micro-particles

Abstract

We developed a self-assembly process of SiO 2 particles to fabricate desired patterns of colloidal crystals having high feature edge acuity and high regularity. A micropattern of colloidal methanol prepared on a self-assembled monolayer in hexane was used as a mold for particle patterning, and slow dissolution of methanol into hexane caused shrinkage of molds to form micropatterns of close-packed SiO 2 particle assemblies. We further developed spherical particle assemblies and micropatterns of them. Hydrophilic regions of a patterned self-assembled monolayer were covered with methanol solution containing SiO 2 particles and immersed in decalin. Particles were assembled to form spherical shapes and consequently, micropatterns of spherical particle assemblies were successfully fabricated through self-assembly. This result is a step toward the realization of nano/micro periodic structures for next-generation photonic devices by a self-assembly process.