Symmetric diblock copolymer thin films confined between homogeneous and patterned surfaces: Simulations and theory

Abstract

The behavior of symmetric diblock copolymer thin films confined between two surfaces was described using a simple phenomenological theory. The theory was applied to construct the phase diagrams of the films. Results of the phenomenological theory showed that the amplitudes of the undulation were on the same order of magnitude as observed in the Monte Carlo simulations.