Spontaneous Si-C bond cleavage in (TriphosSi)-nickel complexes

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Abstract

Herein, we report on the versatile reactions of CH3C(CH2PPh2)3 as well as CH3Si(CH2PPh2)3 derived Ni-complexes. While Ni[CH3C(CH2PPh2)3] complexes reveal high stability, the Ni[CH3Si(CH2PPh2)3] analogs show rapid decomposition at room temperature and afford the unprecedented pseudo-tetrahedral phosphino methanide complex 5. We provide a detailed electronic structure of 5 from X-ray absorption and emission spectroscopy data analysis in combination with DFT calculations, as well as from comparison with structurally related complexes. A mechanistic study for the formation of complex 5 by reaction with BF4− is presented, based on a comparison of experimental data with quantum chemical calculations. We also show a simple route towards isolable Ni(i)-complexes on the gram scale.

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Petuker, A., Mebs, S., Schuth, N., Gerschel, P., Reback, M. L., Mallick, B., … Apfel, U. P. (2017). Spontaneous Si-C bond cleavage in (TriphosSi)-nickel complexes. Dalton Transactions, 46(3), 907–917. https://doi.org/10.1039/c6dt04048a

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