Journal Article

New technique for producing thin boron films

Nuclear Inst. and Methods in Physics Research, A (1989) 282(1) 124-127
DOI: 10.1016/0168-9002(89)90123-X
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Abstract

A review will be presented of methods for producing thin boron films in high-vacuum processes applying electron bombardment and resistive heating to evaporate the boron. Previous papers have noted the problem of sputtering of the boron source during the evaporation. A method for reducing sputter-coating will be described. © 1989.

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APA

Thomas, G. E. (1989). New technique for producing thin boron films. Nuclear Inst. and Methods in Physics Research, A, 282(1), 124–127. https://doi.org/10.1016/0168-9002(89)90123-X

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