Abstract
Permittivity of a SU-8 (3050) resist film baked at 100, 150, 200 and 250oC is characterized by a typical capacitance method in the frequency range from 100Hz to 5MHz. The permittivity is relatively constant in the frequency range, but slight dependency on baking temperature can be confirmed. The dielectric loss tangent of resist film increases gradually up to 0.03 but relatively low. The typical dielectric properties of resist material can be confirmed experimentally, which indicates an application possibility of resist material as an electronic device component material.
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Kawai, A., & Ohtani, S. (2015). Frequency dispersion of permittivity of SU-8 resist thin film. Journal of Photopolymer Science and Technology, 27(6), 711–712. https://doi.org/10.2494/photopolymer.27.711
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