Abstract
Oxime sulfonate compounds are one of the important chemistry as photoacid generator for advanced lithography application and practically used in mass production of semiconductor chips. This chemistry is adjustable for various applications like g-/h-/i-line, KrF and ArF lithography. This paper describes an overview of oxime sulfonate chemistry for semiconductor resist application, including commercially available products.
Author supplied keywords
Cite
CITATION STYLE
Yamato, H., Asakura, T., Nishimae, Y., Matsumoto, A., Tanabe, J., Birbaum, J. L., … Ohwa, M. (2007). Oxime sulfonate chemistry for advanced microlithography. Journal of Photopolymer Science and Technology, 20(5), 637–642. https://doi.org/10.2494/photopolymer.20.637
Register to see more suggestions
Mendeley helps you to discover research relevant for your work.
