A second-order erosion slowness theory of the development of surface topography by ion-induced sputtering

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Abstract

The spatial variation of energy deposited in a solid can lead to local variations in sputtering yield at points on the surface neighbouring the point of ion impact. An approximate theory is developed to describe this local sputtering yield variation in terms of the local morphology. It is then shown how, if this local variation merely moderates the standard sputtering yield-projectile incidence angle function by multiplication, an erosion slowness theory can be simply modified and generalized to allow prediction of the time development of sputtered surface morphology. Both transient and steady-state morphologies are explored. © 1981 Chapman and Hall Ltd.

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Carter, G., Nobes, M. J., & Webb, R. P. (1981). A second-order erosion slowness theory of the development of surface topography by ion-induced sputtering. Journal of Materials Science, 16(8), 2091–2102. https://doi.org/10.1007/BF00542369

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