Progress in thermal plasma deposition of alloys and ceramic fine particles

Abstract

The recent progress of thermal plasma processes for deposition of fine powder of various metallic and ceramic materials is outlined in this report. R.F. plasma processes for synthesis of ultra fine powder (UFP) of nonoxide ceramic materials such as silicon nitride and silicon carbide are mainly described. Plasma evaporation processes for production of metallic UFP and R.F. plasma processes for synthesis of ceramic UFP which have been developed lately in Japan are explained in detail. The importance of a national research project to be started in order to develop plasma materials processing in this year in Japan is also simply described. © 1985 IUPAC