Photoelectrochemical deposition of microscopic metal film patterns on Si and GaAs

Abstract

Microscopic metal film patterns have been imaged on p-Si and n- and p-GaAs by photoelectrochemical deposition from standard aqueous plating solutions. The photodeposition of Cu, Ni, Pd, and Au films was investigated. Resolution exceeding 10 μ has been achieved for deposits of Au on p-GaAs and Cu on p-Si.