Abstract
We investigated the formation of microstructure on the surface of Poly(methyl methacrylate) - based polymer (PMMA - based polymer), which is a polymer for the ArF photoresist, in decomposition process by using atomic hydrogen generated by a tungsten hot-wire catalyst.
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Takagi, S., Nishiyama, T., Yamamoto, M., Sato, E., Kamimura, T., Ogata, T., & Horibe, H. (2016). Decomposition process of pmma-based polymer using atomic hydrogen generated by a tungsten hot-wire catalyst. Journal of Photopolymer Science and Technology, 29(4), 629–631. https://doi.org/10.2494/photopolymer.29.629
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