Sorption of As(V) from aqueous solution using in situ growth MgAl–NO3 layered double hydroxide thin film developed on AA6082

Abstract

In this work, the MgAl–NO3 layered double hydroxide (LDH) developed by the single-step in situ growth method is used as a robust sorbent to remove arsenic from aqueous solution. The MgAl-LDH exhibiting two different distinct morphologies (platelet structure and cauliflower-shaped structure) was developed on the AA6082 substrate with the variation in synthesis parameters, where AA6082 specimen acts as both the reactant and support. The structural characterizations were investigated through scanning electron microscopy, X-ray diffraction analysis, and energy dispersion spectroscopy, while the adsorption of arsenic on MgAl-LDH was studied through Langmuir and Freundlich models. The Langmuir isotherms have shown a maximum adsorption capacity of around 213 and 239 mg/g for platelet and cauliflower-like MgAl-LDH, respectively. The pseudo-first-order and pseudo-second-order Lagergren kinetic models were studied for the understanding of the adsorption kinetics. The results depicted that anion exchange and the electrostatic interaction are the possible reasons of arsenic sorption on MgAl-LDH, but the ion exchange mechanism is found to be the dominant mechanism. The maximum adsorption capacity of cauliflower-shaped MgAl-LDH was found to be slightly higher than platelet structure, but overall maximum arsenic adsorption uptake values of both in situ growth structures have found to be exceeded the mostly reported MgAl-LDH maximum adsorption capacities.