Abstract
In crystalline, dislocation-free, Si/Ge nanowire axial heterojunctions grown using the vapor-liquid-solid technique, photoluminescence and Raman spectroscopy reveal a SiGe alloy transition layer with preferential chemical composition and strain. In addition to the lattice mismatch, strain in Si/Ge nanowires is observed from a temperature dependent study to be affected by the difference in Si and Ge thermal expansion. The conclusions are supported by analytical transmission electron microscopy measurements. © 2009 American Institute of Physics.
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CITATION STYLE
Chang, H. Y., Tsybeskov, L., Sharma, S., Kamins, T. I., Wu, X., & Lockwood, D. J. (2009). Photoluminescence and Raman scattering in axial Si/Ge nanowire heterojunctions. Applied Physics Letters, 95(13). https://doi.org/10.1063/1.3240595
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