Abstract
We present a high-spatial-resolution subsurface microscopy technique that significantly increases the numerical aperture of a microscope without introducing an additional spherical aberration. Consequently, the diffraction-limited spatial resolution is improved beyond the limit of standard subsurface microscopy. By realizing a numerical aperture of 3.4, we experimentally demonstrate a lateral spatial resolution of better than 0.23 μm in subsurface inspection of Si integrated circuits at near infrared wavelengths. © 2001 American Institute of Physics.
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CITATION STYLE
Ippolito, S. B., Goldberg, B. B., & Ünlü, M. S. (2001). High spatial resolution subsurface microscopy. Applied Physics Letters, 78(26), 4071–4073. https://doi.org/10.1063/1.1381574
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