Abstract
A chemical method for electroless deposition of thin film of a-PbO2 and Tl2O3 has been developed. The deposition has been performed by ammonia, persulfate ion and metal ions at a higher temperature. The electrical resistance, mobility and carrier concentration have been measured with variation of thickness of the films. Optical absorption spectra reveal the band edges which are 1·7 eV and 1·95 eV of a-PbO2 and Tl2O3 respectively. © 1980 Indian Academy of Sciences.
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APA
Bhattacharya, R. N., & Pramanik, P. (1980). Electroless deposition of Alpha-PbO2 and Tl2O3. Bulletin of Materials Science, 2(4), 287–291. https://doi.org/10.1007/BF02802067
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