Reducing electric-field-enhancement in metal-dielectric grating by designing grating with asymmetric ridge

Abstract

Diffraction gratings are an essential optical component of high-power, short-pulse lasers. The maximum output of high-power pulsed lasers is always determined by laser resistance of gratings and this resistance is strongly dependent on the local near electric field intensity in the grating structure. We presented a novel method of reducing electric-field-enhancement in metal-dielectric grating by designing asymmetric grating ridge while maintaining high diffraction performance. Compared with the common isosceles trapezoidal grating, the grating with asymmetric ridge got a 0.04% reduction of diffraction efficiency in TE polarization at 1053 nm incident wavelength but a 21.3% reduction of maximal electric-field-enhancement in grating structure. This method can be applied to any surface-relief gratings to reduce the electric-field-enhancement for improving the laser induced damage threshold (LIDT) of grating and supporting the grating-based chirped pulse amplification (CPA) system to develop into higher peak-power levels.