Diffusion behavior of the spin valve structure

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Abstract

NiMn/NiFe/Co/Cu/Co/NiFe/seed layer (sample No. 1) and NiFe/CoFe/Cu/CoFe/Ru/CoFe/NiFe/ NiMn/Seed layer (sample No. 2), are investigated by using high resolution analytical transmission electron microscopy and an imaging filter. The compositional analysis demonstrated that the diffusions of the Mn and Ni into the Cu/Co bilayer are only observed in sample No. 1. This result indicated that the Ru layer in sample No. 2 might not only act as the spacer of the synthetic antiferromagnet but also behaves as a good diffusion barrier for the Ni and Mn element in the spin valve structure. The diffusion coefficients of constituent elements are simply investigated using the Matano-Boltzmann method. The diffusion mechanisms of Cu in Co layer and Co in Cu layer were primarily dominated by the grain boundary. © 2001 American Institute of Physics.

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Huang, R. T., Chen, F. R., Kai, J. J., Tsu, I. F., Mao, S., & Kai, W. (2001). Diffusion behavior of the spin valve structure. Journal of Applied Physics, 89(11 II), 7625–7627. https://doi.org/10.1063/1.1357129

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