Facile Synthesis and Characterization of CoS2–SiO2/Chitosan: The Photocatalysis in Real Samples, and Antimicrobial Evaluation

Abstract

In the present work, The SiO2, and CoS2–SiO2 nanomaterials and incorporated on chitosan was developed as photocatalyst for photocatalytic degradation of toxic compound such as ethidium bromide as a hazard mutagenic pollutant. The SiO2, and CoS2–SiO2 nanomaterials were prepared using the sol–gel/sonochemical method. Therefore, the nano photocatalyst were characterized by various analytical devices such as scanning electron microscopy (SEM), X-ray diffraction and photoelectron (XRD and XPS) analysis, energy dispersive X-ray spectrometer (EDS), UV–Vis absorption spectroscopy and dynamic light scattering, in order to attain the structural properties. The average crystallite size values of SiO2, CoS2–SiO2, and CoS2–SiO2/Chitosan nanocomposites are 0.63, 40.28, and 69.75 nm, respectively. The band-gap values was obtained 8.9–2.7 eV for SiO2, CoS2–SiO2, and CoS2–SiO2/Chitosan nanocomposites, respectively. The photocatalytic performances of the three prepared nano-photocatalyst were examined by UV-light with help the photo-degradation of ethidium bromide. The CoS2–SiO2/Chitosan nanocomposites photocatalyst shows the high amount of photocatalytic degradation (96.00%) in comparison to SiO2, and CoS2–SiO2 nanomaterials. The results demonstrated that the all prepared nano-photocatalyst under UV irradiation was in pH 5 at 40 min. The antifungal and antibacterial of the SiO2, CoS2–SiO2, and CoS2–SiO2/Chitosan were examined. The CoS2–SiO2/Chitosan (high 11.00 mm inhibition zone) has appropriate antimicrobial activity compared with pure SiO2.