High-resolution nanofabrication using a highly focused electron beam

Abstract

A highly focused electron beam can be used to shape nanodevices. We demonstrate electron beam etching of nanoholes through multiwalled carbon nanotubes (MWNTs) and niobium nanowires. Nanoholes, as small as ∼2.5 nm in diameter, can be reproducibly fabricated. This technique can also be used to fabricate constrictions and larger nanoholes in MWNTs. We argue that with some improvement, this technique might be used to pattern suspended graphene by the removal of targeted single atoms. © 2008 American Institute of Physics.